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Applied E3 is a fab-wide automation and equipment engineering system (EES) that dramatically improves manufacturing equipment efficiency and process control for manufacturers in the semiconductor, display, and solar industries. E3 is the industry’s only EES solution that combines fault detection and classification (FDC), run-to-run (R2R) control and equipment performance tracking (EPT) on a common automation platform. These modules are used for monitoring, automating and optimizing equipment and process performance thereby reducing the overall cost of ownership. The distributed E3 architecture ensures high availability and flexibility in scaling to end user capacity requirements.
- Pre-configured R2R models for critical areas of the fab reduce deployment time
- Quickly and easily make changes with configurable equipment strategy system
- High availability architecture with no single point of failure
- Improves equipment performance and lower overall cost of ownership
- Reduces training requirements and increases operator efficiency
For additional information, download the E3 product datasheet.
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